4월 9일 (화) 개최되는 신소재공학과 정기세미나를 아래와 같이 안내해드립니다.

= 아 래 =

1. 일 시 : 2013. 4. 9 (화), 16:00 ~
2. 장 소 : 응용공학동 1층 영상강의실
3. 연 사 : 정재경 교수 (인하대학교 신소재공학과)
4. 제 목 : Recent Trends in Research and Development of Metal Oxide Semiconductor electrode structures
5. 발표내용요약(Abstract)

  In order for large-sized AMOLED displays to achieve widespread adoption, manufacturers must find a way to mass produce them at affordable prices. However, scaling-up of production lines causes several technological challenges. In this presentation, the critical issues of conventional amorphous-Si and poly-Si TFT backplane will be reviewed, which is crucial for the success of AMOLEDs. And then, we will introduce amorphous Zn-based oxide TFT, which can be an attractive alternative to the Si TFTs. Based on the understanding of device physics regarding the important device parameters including field-effect mobility, sub-threshold gate swing, and contact resistance in oxide TFTs, the device architectures and processes to improve the device performance will be addressed. In addition, the device reliability including gate bias, thermal, light-induced instability will be addressed, which is one of the most critical issue for the oxide TFTs to be adopted for the advanced flat panel display. In particular, the degradation mechanisms of the oxide TFTs will be discussed based on the dynamical interaction between the back channel of oxide semiconductor and the ambient such as oxygen or water rather than the conventional charge trapping or injection model. Finally, the strategies for improving the stability of oxide TFTs will be suggested based on the proposed mechanism frame work