= 아 래 =
1. 일 시 : 2013. 4. 30 (화), 16:00 ~
2. 장 소 : 응용공학동 1층 영상강의실
3. 연 사 : 이 헌 교수 (고려대학교 신소재공학부)
4. 제 목 : Nanoimprint Lithography and its application for optical devices
Current state of the art process technologies of nanoimprint lithography and its application to photonic devices such as light emitting diodes and photovoltaic devices are presented. Using nanoimprint lithography, a few tens to several hundred nanometer sized patterns of functional materials, including polymer, ITO, ZnO. TiO2,and nano-silver,can be easily for medon various substrates. Conventional polymer resin, along with sol-gel solution, nano-particle dispersed ink was used as an imprint resin. As a substrate, Si wafer, glass plate, flexible polymer films and non-flat surfaced lenz were used. Nano-patterns of functional materials were formed directly on the surface of light emitting diode wafers and solar cells. As a result, the performance of those devices was greatly improved by inserted nano-structures. Air pressed nanoimprint system was used for these study. In this seminar, various process of nanoimprint lithography and its application to solar cells were presented.